Product Features
High degree of ionization and decomposition of gas molecules, uniform ion density
High voltage source and plasma generator isolated from each other, high safety factor
Humanized operation interface, easy operation and maintenance
Rebrable performance, good interlock, fault alarm and real-time monitoring functions
A shielding system is installed at the back end of the cavity to avoid electromagnetic radiation
Process Selective Removal of Contaminants
Can store multiple sets of recipes at the same time, can be called
The whole process process is controllable, and various process parameters can be set, modified and monitored onbrne.
There is no internal electrode, and there is no material source other than the working gas in the plasma chamber.
Chip microwave cleaning, cleaning effect is more uniform, softer, can achieve continuous production